Effects of acid concentration on hybrid layer thickness: A SEM study. by Wendy L. Tang

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Sixty extracted human third molars were randomly divided into 12 groups. Dentin was exposed and etched with the respective etchants (35% aqueous phosphoric acid and gel, 10 and 5% aqueous phosphoric and maleic acids). A water- and an acetone-based adhesive were applied to moist dentin and sealed with resin composite. Four longitudinal 1-mm sections were obtained; two sections were first deproteinized in 5.25% NaOCl and all four were critical point dried. Hybrid layer thickness and the degree of resin penetration were determined under the SEM and statistically analyzed.5 and 10% acids produced a significantly thinner HL with both adhesives and a significantly greater degree of resin penetration with SBMP (p<0.05). Under the SEM, well-defined hybrid layers were seen with resin tag formation. Deproteinized sections demonstrated an uninfiltrated layer between the adhesive and the underlying dentin for both adhesive resins in all etchant groups.

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The Physical Object
Pagination98 leaves.
Number of Pages98
ID Numbers
Open LibraryOL21549834M
ISBN 109780494211045
OCLC/WorldCa440076895

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The effects of acid etching time on surface mechanical properties of dental hard tissues SEM study. Am J Dent ; 4: The hybrid-layer (HL) thickness and interfacial micro. This layer, which is thicker at the beginning of acid etching, has been reported to play a key role in protection and to increase cell adhesion.

F was only observed after 2 min of HF acid immersion, when the surface TiO 2 first reacts with fluoride ions from the by: Coating microstructure and thickness were investigated via optical microscopy as well as field emission scanning electron microscopy (FE-SEM) on polished cross sections.

The measured coating thickness was ± μm for the HA, ± μm for the TCP, and ± μm for the GB14, successfully fulfilling the objective of this study. SEM image of a dentin interface formed with a two-step etch-and-rinse system, showing the hybrid layer along with a wide number of resin tags.

In theory, the hybrid layer and resin tags should be extended to the same depth to which dentin demineralization occurred as a result of the acid etching : Alexandra Vinagre, João Ramos. Polyhedral oligomeric silsesquioxane (POSS) is an inorganic-organic hybrid consisting of a cage of silica with at least one organic substituent or OH group in each corner of the structure (Figure Effects of acid concentration on hybrid layer thickness: A SEM study.

book, it is an intermediate between silica (SiO 2) and silicones (R 2 SiO). These materials are prepared using the sol–gel process, usually starting from trichlorosilane or trialkoxysilane [23].

The silver (Ag) ions in an ionic solution of hydrofluoric acid (HF) and hydrogen peroxide (H 2 O 2) have been used to prepare the arrays of SiNWs from single crystal wafers [34, 35] The effects of various process parameters such as the etchant concentration of H 2 O 2, etching time, and postetch treatment on the morphology, and optical Author: Adel Najar, Amine El Moutaouakil.

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